The company will continue to expand its product line and application areas, and has always been committed to providing corrosion-resistant and ultra-pure fluid transportation piping systems for the semiconductor, photovoltaic and electronic chemical industries.
Wet station is used to remove impurities such as particles, natural oxide layers, organic matter, and metal contamination from the surface of wafers.
Wet station is used to remove impurities such as particles, natural oxide layers, organic matter, and metal contamination from the surface of semiconductor substrate chips
CDS (Central Chemical Dispense System） is mainly used to provide 24-hour uninterrupted supply of high-purity chemical solution for production lines.
The company actively seeks cooperation with outstanding domestic and foreign companies to jointly promote the development and progress of the industry.
We help you avoid the pitfalls to deliver the quality and value your wafer drying need, on-time and on-budget.