FOUP Cleaning

Third generation cleaning equipment for 2-12 inch wafers 

Suitable for various material boxes, including PP, PVD 

Multiple design modes such as front loading/unloading, front loading/unloading, etc 

Standard Factory Hot Air Dry Quantity 

Hot CDA, N2 drying optional 

Standard DIW cleaning container 

Minimum footprint design for cleanroom 

Design for maximizing production capacity 

Strong technical support and complete spare parts 

Low maintenance cost and low failure rate 

Manual retrieval and placement of boxes, can be designed according to customer requirements 

Automated washing and drying, one click start Human machine interface control parameters

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Product Description

Equipment competitiveness: 

1. Price advantage: cost control (raw materials, labor, after-sales), profit proportion 

2. Quality: whole machine operation, component quality, assembly process, equipment debugging 

3. Delivery time: component delivery time, assembly time, debugging time 

4. Appearance: Overall beautiful, detailed treatment, color matching 

5. Differentiation: Compatible with customization 

6. Customer First: Improve assembly, design, and customer feedback 

Deep cooperation with semiconductor component factories, such as FOUP ceramic grinding discs, quartz tubes, and other manufacturers.

Jiangsu Zenith Electronic Technology has always been at the forefront of the industry, closely monitoring market dynamics and technological development trends. The company has an experienced and technologically advanced R&D team, constantly launching innovative and competitive products. The product line covers various key accessories such as pumps, valves, filters, heaters, water guns, and PFA tubes, and also provides non-standard customized machining services to meet the diverse needs of customers. In the field of corrosion-resistant and ultra pure fluid transportation pipelines, Jiangsu Zenith Electronic Technology's products have significant advantages. The company adopts advanced production processes and materials to ensure that the products have good corrosion resistance and high purity, and can operate stably in harsh environments, providing customers with stable and reliable fluid transportation guarantees for their production lines.

 

Equipment Competitiveness

FOUP Cleaning

Price Advantage

Cost control (raw materials, labor, after-sales), profit proportion

FOUP Cleaning

Quality

Whole machine operation, component quality, assembly process, equipment debugging

FOUP Cleaning

Delivery Time

Component delivery time, assembly time, debugging time

FOUP Cleaning

Appearance

Overall beautiful, detailed treatment, color matching

FOUP Cleaning

Differentiation

Compatible with customization

FOUP Cleaning

Customer First

Improve assembly, design, and customer feedback

Extensive Experience in Applications

The company will continue to expand its product line and application areas, and has always been committed to providing corrosion-resistant and ultra-pure fluid transportation piping systems for the semiconductor, photovoltaic and electronic chemical industries.

FOUP Cleaning

Wafer

Wet station is used to remove impurities such as particles, natural oxide layers, organic matter, and metal contamination from the surface of wafers.

FOUP Cleaning

Semiconductor

Wet station is used to remove impurities such as particles, natural oxide layers, organic matter, and metal contamination from the surface of semiconductor substrate chips.

Contact Us to Get

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Customized Product

 

Responsive Service

 

Competitive Price Compared To The Market

 

Fast Logistics

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Consult Your Wafer Drying Experts

We help you avoid the pitfalls to deliver the quality and value your wafer drying need, on-time and on-budget.